Photoresist AZ 4620 Positive Intelligence
High-performance positive photoresist for semiconductor manufacturing and thick-film microfabrication applications.
Overview
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Live value: $180/liter · Range: $180–$450
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About
Photoresist AZ 4620 Positive is a high-performance, thick-film positive photoresist designed for semiconductor manufacturing and microfabrication processes. This DNQ/novolac-based resist is sourced from specialized chemical manufacturers and formulated to provide excellent resolution and sidewall profiles for photolithography applications. Primary uses include creating thick resist layers (up to 20+ microns) for MEMS devices, electroplating molds, and deep UV lithography processes. Key properties include superior adhesion, high aspect ratio capabilities, excellent process latitude, and compatibility with standard photolithography equipment. The resist offers outstanding etch resistance and thermal stability, making it ideal for demanding fabrication requirements. Makers and semiconductor facilities purchase AZ 4620 for its reliability in producing precise microstructures, consistent batch-to-batch performance, and ability to achieve fine feature resolution while maintaining structural integrity during subsequent processing steps.
FAQ
What is Photoresist AZ 4620 Positive primarily used for?+
High-performance positive photoresist for semiconductor manufacturing and thick-film microfabrication applications.
How is pricing tracked?+
Pricing is tracked from live listings and normalized into a $180–$450 intelligence range.
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Approximate conversions · mid-price · liter